AI 芯片生产中的原子层沉积工艺，突出在硅片上沉积超薄层的精度
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会员专享%20--%3e%3csvg%20version='1.1'%20id='图层_1'%20xmlns='http://www.w3.org/2000/svg'%20xmlns:xlink='http://www.w3.org/1999/xlink'%20x='0px'%20y='0px'%20viewBox='0%200%20300%20109.84'%20style='enable-background:new%200%200%20300%20109.84;'%20xml:space='preserve'%3e%3cstyle%20type='text/css'%3e%20.st0{fill:%23FF0000;}%20.st1{fill:%23FFFFFF;}%20%3c/style%3e%3cpath%20class='st0'%20d='M282,109.84H18c-9.94,0-18-8.06-18-18V18C0,8.06,8.06,0,18,0H282c9.94,0,18,8.06,18,18v73.84%20C300,101.78,291.94,109.84,282,109.84z'/%3e%3cg%3e%3cg%3e%3cpath%20class='st1'%20d='M79.43,23.7l26.56,62.53H92.17l-5.74-14.27H60.86L55.3,86.22H42.29L68.04,23.7H79.43z%20M82.21,61.37%20l-8.79-21.95L64.9,61.37H82.21z'/%3e%3cpath%20class='st1'%20d='M126.54,86.22h-13.01V23.7h13.01V86.22z'/%3e%3cpath%20class='st1'%20d='M169.25,62.22V51.54h25.12V77c-2.03,3.13-5.28,5.62-9.74,7.47c-4.46,1.85-9.38,2.78-14.76,2.78%20c-6.4,0-12.08-1.37-17.05-4.1c-4.97-2.73-8.82-6.55-11.57-11.45c-2.75-4.9-4.13-10.51-4.13-16.83c0-6.38,1.42-12.01,4.26-16.91%20c2.84-4.9,6.74-8.68,11.71-11.36c4.96-2.68,10.47-4.01,16.51-4.01c6.04,0,11.29,1.3,15.75,3.89c4.46,2.59,7.46,5.91,9.02,9.95%20l-10.77,5.89c-1.32-2.62-3.2-4.68-5.65-6.19c-2.45-1.51-5.35-2.26-8.7-2.26c-3.53,0-6.7,0.85-9.51,2.56%20c-2.81,1.71-5.02,4.16-6.64,7.35c-1.62,3.19-2.42,6.89-2.42,11.1c0,4.33,0.82,8.09,2.47,11.28c1.64,3.19,3.98,5.64,7,7.35%20c3.02,1.71,6.53,2.56,10.54,2.56c4.67,0,8.31-1.22,10.95-3.67V62.22H169.25z'/%3e%3cpath%20class='st1'%20d='M241.34,73.5c2.3-1.59,4.14-3.81,5.52-6.66l10.86,5.98c-1.62,4.22-4.58,7.67-8.88,10.38%20c-4.31,2.71-9.45,4.06-15.43,4.06c-5.8,0-11.1-1.34-15.88-4.02c-4.79-2.68-8.58-6.48-11.4-11.4c-2.81-4.92-4.22-10.58-4.22-16.96%20c0-6.38,1.39-12.01,4.17-16.91c2.78-4.9,6.58-8.68,11.4-11.36c4.81-2.68,10.12-4.01,15.93-4.01c5.98,0,11.13,1.35,15.43,4.06%20c4.31,2.71,7.27,6.16,8.88,10.38L246.86,43c-1.38-2.85-3.22-5.07-5.52-6.66c-2.3-1.59-5.04-2.39-8.21-2.39%20c-3.35,0-6.34,0.85-8.97,2.56c-2.63,1.71-4.71,4.14-6.24,7.3c-1.53,3.16-2.29,6.85-2.29,11.06c0,4.22,0.76,7.92,2.29,11.11%20c1.53,3.19,3.6,5.64,6.24,7.35c2.63,1.71,5.62,2.56,8.97,2.56C236.3,75.89,239.04,75.09,241.34,73.5z'/%3e%3c/g%3e%3c/g%3e%3c/svg%3e)
AI 芯片生产中的原子层沉积工艺，突出在硅片上沉积超薄层的精度
AI 芯片生产中的原子层沉积工艺，突出在硅片上沉积超薄层的精度这张图片素材展示了 AI 芯片生产中先进的原子层沉积工艺。该工艺在硅片上沉积超薄层时具有极高的精度，体现了微电子制造领域的创新与突破。其涉及到对分子结构的精准控制，确保了沉积的均匀性。此技术代表了半导体制造的前沿水平，融合了纳米技术，是工业工程中复杂而精细的制造流程。它对于提升电路性能、硬件质量至关重要，彰显了未来自动化生产的高效率，是研发过程中可视化的重要成果。
- 素材ID：836720811举报
- 格式：JPG
- 作者：Curioso.Photography
- 尺寸：S1000 x 613px · 35 x 21cm · 72dpiM2300 x 1411px · 81 x 49cm · 72dpiL4000 x 2453px · 33 x 20cm · 300dpiF5632 x 3456px · 47 x 29cm · 300dpi
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